3G Circular

Gencoa's third generation range of small circular magnetrons are designed to operate under a low pressure range, and include ±45° tilt adjustment, gas injection and a rear utility box for DC, DC-pulsed, RF and HIPIMS processes as standard.

Catering for applications ranging from R&D to small scale production, the 3G circular range of HV sources are available for target diameters of 2" to 5".

With minimal use of polymer and newly-developed magnetics, the sources can perform in the 10-6 Torr range, delivering improvements to the deposition rate, reduced arcing, fewer impurities and a higher density coating.

The sources can be assembled with a choice of magnetic and mechanical options, leading to performance benefits tailored to specific applications, and are built to reliably work with DC, RF, pulsed DC and HiPIMS power supplies.

High yield (HY) magnetics can be fitted to sources with target diameters of 4-5”, delivering target usage of 40% for sputtering of precious metals.

Key features

Low pressure sputtering (10^-6 to 10^-2 torr)
± 45º tilt angle adjustment (1° accuracy)
Standard target sizes
High yield (HY) magnetics available for 4" and 5" target diameters, delivering >40% target usage
Internal gas injection as standard
Rear utility box as standard for RF and HIPIMS
Easy target change and choice of target thickness (1-6mm)
High strength magnetics for sputtering of magnetic material
Indirect or direct target cooling (pre-configured)

Mechanical options

All magnetrons in the 3G circular range are available for internal or external mount, with the following additional options: manual or pneumatic shutter, chimney, wallmount feedthrough, hidden/water-cooled anode.

Dimensions

The table below shows the different options of 3G circular magnetrons, along with each of the included mechanical options. Click on the PDF icons to download dimensional drawings for the required target size.